CARBON ION IRRADIATION EFFECTS ON PULSED LASER DEPOSITED TITANIUM NITRIDE THIN FILMS
Khaliq Mahmood (),
Shazia Bashir,
Mahreen Akram,
Asma Hayat,
FAIZAN-Ul-HAQ and
Shahzad Saadat
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Khaliq Mahmood: Centre for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan
Shazia Bashir: Centre for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan
Mahreen Akram: Centre for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan
Asma Hayat: Centre for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan
FAIZAN-Ul-HAQ: Centre for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan
Shahzad Saadat: Centre for Advanced Studies in Physics (CASP), GC University Lahore, Pakistan
Surface Review and Letters (SRL), 2015, vol. 22, issue 02, 1-10
Abstract:
Pulse laser deposited thin films of TiN are irradiated by 1 MeV carbon (C+) ions beam for various doses ranging 0.4 to 2.8 × 1014ions/cm2. Atomic force microscopy (AFM) analysis reveals the formation of hillocks like structures after ion irradiation. X-ray diffraction (XRD) investigations show that the film crystallinity increases for lower doses ranging from 0.4 to 1.2 × 1014ions/cm2and decreases for higher doses (2 to 2.8 × 1014ions/cm2) of ions. No new bands are identified from Raman spectroscopy. However, a noticeable change in microhardness has been observed. The hillock densities as well as hardness are strongly dependent upon ion dose.
Keywords: Pulsed laser deposition; titanium nitride; C+ion irradiation; nano hillocks; structural modification (search for similar items in EconPapers)
Date: 2015
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DOI: 10.1142/S0218625X15500201
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