EFFECT OF SUBSTRATE TEMPERATURE ON THE GROWTH OF COPPER OXIDE THIN FILMS DEPOSITED BY PULSED LASER DEPOSITION TECHNIQUE

Muhammad Kaif Shabbir, Shazia Bashir, Qazi Salman Ahmed, Nazish Yaseen, Sohail Abdul Jalil, Mahreen Akram, Khaliq Mahmood and Ayesha Khalid
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Muhammad Kaif Shabbir: Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan
Shazia Bashir: Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan
Qazi Salman Ahmed: Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan†Department of Electrical Engineering, Information Technology University, Lahore, Pakistan
Nazish Yaseen: Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan
Sohail Abdul Jalil: Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan†Department of Electrical Engineering, Information Technology University, Lahore, Pakistan
Mahreen Akram: Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan
Khaliq Mahmood: Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan
Ayesha Khalid: Center for Advanced Studies in Physics, Government College University, Lahore, Pakistan†Department of Electrical Engineering, Information Technology University, Lahore, Pakistan

Surface Review and Letters (SRL), 2018, vol. 25, issue 02, 1-14

Abstract: The effect of substrate temperature on growth of pulsed laser deposited copper oxide thin films has been investigated by employing Nd: YAG laser (532nm, 6ns, 10Hz) irradiation at a fluence of 8.2J/cm2. XRD analysis reveals that copper oxide films deposited at room temperature are amorphous in nature, whereas films deposited at higher substrate temperatures are polycrystalline in nature. SEM and AFM analyses revealed that films deposited at substrate temperatures, ranging from room temperature to 300∘C are comprised of large sized clusters, islands and particulates, whereas uniform films with an appearance of granular morphology and distinct bump formation are grown at higher substrate temperatures of 400∘C and 500∘C. The optical bandgap of deposited films is evaluated by UV-VIS spectroscopy and shows a decreasing trend with increasing substrate temperature. Four point probe analysis reveals that electrical conductivity of the deposited films increases with increase in the substrate temperature, and is maximum for highest growth temperature of 500∘C. It is revealed that growth temperature plays a significant role for structure, texture, optical and electrical behavior of copper oxide thin films. The surface and structural properties of the deposited films are well correlated with their electrical and optical response.

Keywords: Pulsed laser deposition; substrate temperature; copper oxide; crystallite size; optical bandgap (search for similar items in EconPapers)
Date: 2018
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DOI: 10.1142/S0218625X18500531

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