EFFECT OF THICKNESS ON THE STRUCTURAL, MICROSTRUCTURAL, ELECTRICAL AND MAGNETIC PROPERTIES OF Ni FILMS ELABORATED BY PULSED ELECTRODEPOSITION ON Si SUBSTRATE

T. Kacel, A. Guittoum, M. Hemmous, E. Dirican, R. M. Öksüzoglu, A. Azizi, A. Laggoun and M. Zergoug
Additional contact information
T. Kacel: Division of Corrosion, Protection and Durability of Materials, Research Center in Industrial Technologies CRTI, BP64 route de Dely Ibrahim Cheraga, Algeria
A. Guittoum: #x2020;Nuclear Research Centre of Algiers, 2Bd Frantz Fanon, BP399, Alger-Gare, Algiers, Algeria
M. Hemmous: #x2020;Nuclear Research Centre of Algiers, 2Bd Frantz Fanon, BP399, Alger-Gare, Algiers, Algeria
E. Dirican: #x2021;Department of Materials Science and Engineering, Faculty of Engineering, Anadolu University, 26470 Eskişehir, Turkey
R. M. Öksüzoglu: #x2021;Department of Materials Science and Engineering, Faculty of Engineering, Anadolu University, 26470 Eskişehir, Turkey
A. Azizi: #xA7;Laboratoire de Chimie, Ingénierie Moléculaire et Nanostructures, Université Ferhat Abbas-Sétif 1, 19000 Sétif, Algeria
A. Laggoun: #xB6;UR-MPE, M’hamed Bougara University, Boumerdes 35000, Algeria
M. Zergoug: Division of Corrosion, Protection and Durability of Materials, Research Center in Industrial Technologies CRTI, BP64 route de Dely Ibrahim Cheraga, Algeria

Surface Review and Letters (SRL), 2018, vol. 25, issue 02, 1-8

Abstract: We have studied the effect of thickness on the structural, microstructural, electrical and magnetic properties of Ni films electrodeposited onto n-Si (100) substrates. A series of Ni films have been prepared for different potentials ranging from −1.6V to −2.6V. Rutherford backscattering spectrometry (RBS), X-ray diffraction (XRD), four point probe technique, atomic force microscopy (AFM) and vibrating sample magnetometry (VSM) have been used to investigate the physical properties of elaborated Ni thin films. From the analysis of RBS spectra, we have extracted the films thickness t (t ranges from 83nm to 422nm). We found that the Ni thickness, t (nm), linearly increases with the applied potential. The Ni thin films are polycrystalline and grow with the 〈111〉 texture. The lattice parameter a (Å) monotonously decreases with increasing thickness. However, a positive strain was noted indicating that all the samples are subjected to a tensile stress. The mean grain sizes D (nm) and the strain εhkl decrease with increasing thickness. The electrical resistivity ρ (μΩ.cm) increases with t for t less than 328nm. The diffusion at the grain boundaries may be the important factor in the electrical resistivity. From AFM images, we have shown that the Ni surface roughness decreases with increasing thickness. The coercive field HC, the squareness factor S, the saturation field HS and the effective anisotropy constant K1eff are investigated as a function of Ni thickness and grain sizes. The correlation between the magnetic and the structural properties is discussed.

Keywords: Ni thin films; pulsed electrodeposition; structural properties; microstructure; magnetization curves; magnetic anisotropy (search for similar items in EconPapers)
Date: 2018
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DOI: 10.1142/S0218625X18500580

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