EFFECT OF POWER AND HYDROTHERMAL HEAT TREATMENT ON RF SPUTTERED COPPER OXIDE THIN FILMS

Jasmeet Kaur and R. Singh
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Jasmeet Kaur: School of Physics, University of Hyderabad, Central University P.O., Hyderabad 500 046, India
R. Singh: School of Physics, University of Hyderabad, Central University P.O., Hyderabad 500 046, India

Surface Review and Letters (SRL), 2018, vol. 25, issue 08, 1-10

Abstract: Nano-crystalline copper oxide films were deposited on quartz substrates by RF-magnetron sputtering in argon gas environment. The XRD patterns show Cu4O3 phase for films deposited at 50 and 60W of RF power. The film deposited at 70W shows existence of Cu4O3 and CuO phases, whereas film deposited at 100W of RF power consists of only CuO phase. Raman spectra and transmission electron microscopy (TEM) also confirm these results. Field emission scanning electron microscopy (FESEM) shows morphological changes in the film as a function of RF power. The optical band gap estimated from the transmission spectra of the films are 2.3 and 1.7eV for Cu4O3 and CuO phase, respectively. The hydrothermal heat treatment of the film leads to transformation of Cu4O3 to CuO phase in the film.

Keywords: Copper oxide; RF sputtering; Raman bands; hydrothermal heating; band gap (search for similar items in EconPapers)
Date: 2018
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DOI: 10.1142/S0218625X1950029X

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