EFFECT OF SEEDING FILM TYPE ON MORPHOLOGY AND ELECTRICAL PROPERTIES OF Ga-DOPED ZnO NANOSTRUCTURES GROWN BY HYDROTHERMAL PROCESS

Krisana Chongsri, Kanokthip Boonyarattanakalin and Wisanu Pecharapa
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Krisana Chongsri: Department of Applied Physics, Faculty of Science and Technology, Rajabhat Rajanagarindra University, Chachoengsao 24000, Thailand
Kanokthip Boonyarattanakalin: College of Nanotechnology, King Mongkuts Institute of Technology Ladkrabang, Bangkok 10520, Thailand
Wisanu Pecharapa: College of Nanotechnology, King Mongkuts Institute of Technology Ladkrabang, Bangkok 10520, Thailand

Surface Review and Letters (SRL), 2018, vol. 25, issue Supp01, 1-6

Abstract: In the present work, we are interested in modifying the structures and electrical properties of Ga-doped ZnO (GZO) nanostructures by incorporation of Ga and F elements into ZnO seeding films. The ZnO, Ga-doped ZnO and F-doped ZnO thin film layers were grown by sol–gel dip coating onto glass substrates. The GZO nanostructures were grown by hydrothermal method starting from zinc nitrate and gallium (III) nitrate hydrate with a crystal growth assistance using the different types of seeding film layers. The X-ray diffractometer (XRD) and field emission scanning electron microscope (FE-SEM) are observe for the crystal structures and surface morphologies of GZO nanostructures. The changes in electrical resistance of the GZO nanostructures due to the different seeding layers were analyzed by the four-point probe technique. It is shown that the structural and electrical properties are found to be affected by the types of seeding layers.

Keywords: GZO nanostructures; seeding layer; hydrothermal method (search for similar items in EconPapers)
Date: 2018
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DOI: 10.1142/S0218625X1840005X

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