INFLUENCE OF Fe/Si THICKNESS RATIO ON STRUCTURAL AND MAGNETIC PROPERTIES OF Fe3Si FILMS FABRICATED BY SPUTTERING

Jing Xie, Quan Xie, Rui Ma, Jin Huang and Chong Zhang
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Jing Xie: Department of Big Data and Information Engineering, Guizhou University, Guiyang 550025, P. R. China†Department of Physics and Electronic Science, Guizhou Normal University, Guiyang 550001, P. R. China
Quan Xie: Department of Big Data and Information Engineering, Guizhou University, Guiyang 550025, P. R. China
Rui Ma: Department of Big Data and Information Engineering, Guizhou University, Guiyang 550025, P. R. China
Jin Huang: Department of Big Data and Information Engineering, Guizhou University, Guiyang 550025, P. R. China
Chong Zhang: Department of Big Data and Information Engineering, Guizhou University, Guiyang 550025, P. R. China

Surface Review and Letters (SRL), 2019, vol. 26, issue 01, 1-7

Abstract: The structural and magnetic properties of Fe3Si films fabricated by layered sputtering on Si substrates dependent on the Fe/Si thickness ratio varying from 2:1 to 4:1 were investigated. X-ray diffraction (XRD) results show that over the whole range of the Fe/Si thickness ratio considered, all films consist of the polycrystalline Fe3Si phase. The film produced with the Fe/Si thickness ratio of 3:1 shows relatively high structural quality. Scanning electron microscopy (SEM) images reveal that the film layer can be clearly observed and the thickness of the film layer at Fe/Si thickness ratio of 3:1 is the thinnest. From the analysis of the magnetization curves, all of these films exhibit ferromagnetic behavior at room temperature. The sample at Fe/Si thickness ratio of 3:1 shows a high Ms value of ∼831emu/cm3, which is slightly lower than the bulk value of Fe3Si. The variety of its coercive force Hc is associated with the change of grain size D through Hc∝1∕D, and the discrepancy between the Hc values of these films and the bulk Fe3Si is due to defects pinning magnetic domain. Meanwhile, the electrical resistivity remarkably decreases with the increase of the Fe/Si thickness ratio.

Keywords: Fe3Si films; Fe/Si thickness ratio; layered sputtering; structural properties; magnetic properties (search for similar items in EconPapers)
Date: 2019
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DOI: 10.1142/S0218625X18501317

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