AMORPHIZATION OF CERIUM MONONITRIDE DURING OXIDIZATION CHARACTERIZED BY OPTICAL MICROSCOPY, SCANNING ELECTRON MICROSCOPY, X-RAY DIFFRACTION AND X-RAY PHOTOELECTRON SPECTROSCOPY

Wei Liang, Qifa Pan, Yin Hu, Lizhu Luo, Kezhao Liu and Zhengjun Zhang
Additional contact information
Wei Liang: The State Key Laboratory for New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084, P. R. China†High-Tech Institute of Beijing, Beijing 100094, P. R. China
Qifa Pan: #x2021;Science and Technology on Surface Physics and Chemistry Laboratory, Mianyang 621908, P. R. China
Yin Hu: #x2021;Science and Technology on Surface Physics and Chemistry Laboratory, Mianyang 621908, P. R. China
Lizhu Luo: #x2021;Science and Technology on Surface Physics and Chemistry Laboratory, Mianyang 621908, P. R. China
Kezhao Liu: #xA7;China Academy of Engineering Physics, Mianyang 621907, P. R. China
Zhengjun Zhang: #xB6;The Key Laboratory of Advanced Materials (MOE), School of Materials Science and Engineering, Collaborative Innovation Center of Advanced Nuclear Energy Technology, Tsinghua University, Beijing 100084, P. R. China

Surface Review and Letters (SRL), 2019, vol. 26, issue 04, 1-7

Abstract: Cerium mononitride (CeN) film was fabricated by dual ion beam sputtering deposition method on silicon wafer. The oxidization process of CeN film was monitored by optical microscopy (OM), scanning electron microscopy (SEM), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. The results showed that, when the CeN film was exposed to ambient atmosphere, bubbles appeared on the film surface rapidly and then the surface flaked off to powders. Meanwhile, the CeN film changed from polycrystalline to amorphous. XPS analysis indicated that the CeN was oxidized to Ce2O3 initially, and then further oxidized to CeO2. These results indicated that the CeN film degraded easily in ambient atmosphere, exhibiting little or no passivation.

Keywords: Cerium mononitride; dual ion beam sputtering deposition; oxidization; amorphization; optical microscopy; scanning electron microscopy; X-ray diffraction; X-ray photoelectron spectroscopy (search for similar items in EconPapers)
Date: 2019
References: View complete reference list from CitEc
Citations:

Downloads: (external link)
http://www.worldscientific.com/doi/abs/10.1142/S0218625X18501809
Access to full text is restricted to subscribers

Related works:
This item may be available elsewhere in EconPapers: Search for items with the same title.

Export reference: BibTeX RIS (EndNote, ProCite, RefMan) HTML/Text

Persistent link: https://EconPapers.repec.org/RePEc:wsi:srlxxx:v:26:y:2019:i:04:n:s0218625x18501809

Ordering information: This journal article can be ordered from

DOI: 10.1142/S0218625X18501809

Access Statistics for this article

Surface Review and Letters (SRL) is currently edited by S Y Tong

More articles in Surface Review and Letters (SRL) from World Scientific Publishing Co. Pte. Ltd.
Bibliographic data for series maintained by Tai Tone Lim ().