PULSE ELECTRODEPOSITED NANO-SIZED Ni–AlN THIN FILMS: PREPARATION AND CORROSION RESISTANCE PREDICTION USING BACKWARD PROPAGATION NETWORK MODEL

Liang Zeng, Chunyang Ma, Hanrui Zuo, Fafeng Xia and Qiang Li
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Liang Zeng: School of Chemical Engineering, Northwest Minzu University, Lanzhou 730030, P. R. China
Chunyang Ma: #x2020;College of Mechanical Science and Engineering, Northeast Petroleum University, Daqing 163318, P. R. China
Hanrui Zuo: #x2020;College of Mechanical Science and Engineering, Northeast Petroleum University, Daqing 163318, P. R. China
Fafeng Xia: #x2020;College of Mechanical Science and Engineering, Northeast Petroleum University, Daqing 163318, P. R. China
Qiang Li: #x2020;College of Mechanical Science and Engineering, Northeast Petroleum University, Daqing 163318, P. R. China

Surface Review and Letters (SRL), 2020, vol. 27, issue 10, 1-9

Abstract: Nano-sized Ni–AlN thin films were prepared by pulse electrodeposition (PE) on A3 steel substrates. The microstructures, surface root-mean-square roughnesses, microhardness values, and corrosion performances of obtained nano-sized Ni–AlN thin films were investigated. Corrosion weight losses of Ni–AlN thin films were predicted by Backward propagation (BP) networks model. The results indicated that average diameters of Ni and AlN embedded in the films were evaluated to 57.9 and 29.2nm, respectively. Also, thin films were observed with uniform and compact surface structures, and Rq value was estimated to only 32.75nm.

Keywords: Preparation; Ni–AlN thin film; microstructure; corrosion resistance; BP networks (search for similar items in EconPapers)
Date: 2020
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DOI: 10.1142/S0218625X19502238

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