A NOVEL FABRICATION METHOD OF TWO-DIMENSIONAL NANO-MOLD BY COMBINING ULTRAVIOLET LITHOGRAPHY WITH WET ETCHING TECHNOLOGY

E Cheng, Suzhou Tang, Lingpeng Liu, Helin Zou and Zhengyan Zhang
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E Cheng: School of Mechanical Engineering, Hebei University of Technology, Tianjin 300401, P. R. China†Research Institute for Structure Technology of Advanced Equipment, Hebei University of Technology, Tianjin 300401, P. R. China
Suzhou Tang: #x2021;School of Economics and Management, Tianjin University of Science and Technology, Tianjin 300222, P. R. China
Lingpeng Liu: #xA7;Key Laboratory for Micro/Nano Technology and Systems of Liaoning Province, Dalian University of Technology, Dalian, Liaoning 116024, P. R. China
Helin Zou: #xA7;Key Laboratory for Micro/Nano Technology and Systems of Liaoning Province, Dalian University of Technology, Dalian, Liaoning 116024, P. R. China
Zhengyan Zhang: School of Mechanical Engineering, Hebei University of Technology, Tianjin 300401, P. R. China

Surface Review and Letters (SRL), 2021, vol. 28, issue 01, 1-9

Abstract: Nano-fluidic devices have great potential in the applications of biology, chemistry, and medicine. However, their applications have been hampered by their expensive or complicated fabrication methods. We present a new and simple approach to fabricate low-cost two-dimensional (2D) nano-mold based on ultraviolet (UV) lithography and wet etching. The influence of UV lithography parameters on the width dimension of AZ5214 photoresist was investigated. With the optimized parameters of UV lithography, the width dimension of photoresist patterns had sharply decreased from microscale to nano-scale. At the same time, the influences of etching time on the over-etching amount of SiO2 film and nano-mold depth were also analyzed for further reducing the width of nano-mold. In addition, the effect of photoresist mesas deformation on the nano-mold fabrication was also studied for improving the quality of nano-mold. By the proposed method, trapezoid cross-sectional 2D nano-mold with different dimensions can be obtained for supporting varied applications. The minimum nano-mold arrays we fabricated are the ones with the dimensions of 115nm in top edge, 284nm in bottom edge, and 136nm in depth. This method provides a low-cost way to fabricate high-quality and high-throughput 2D nano-mold.

Keywords: 2D nano-mold; fabrication; UV lithography; over-etching (search for similar items in EconPapers)
Date: 2021
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DOI: 10.1142/S0218625X20500286

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