Disturbance Rejection Run-to-Run Controller for Semiconductor Manufacturing

Marzieh Khakifirooz (), Mahdi Fathi () and Panos M. Pardalos ()
Additional contact information
Marzieh Khakifirooz: Tecnológico de Monterrey
Mahdi Fathi: Mississippi State University
Panos M. Pardalos: University of Florida

Chapter Chapter 13 in Computational Intelligence and Optimization Methods for Control Engineering, 2019, pp 301-319 from Springer

Abstract: Abstract This chapter introduces a framework of disturbance rejection controller for discrete-time Run-to-Run (R2R) control system in semiconductor manufacturing environments. While we discussed the source of uncertainty and disturbance in wafer fabrication process, the photolithography process as one of the cutting-edge steps in wafer fabrication is selected for illustrating the power of disturbance rejection algorithm for compensating the misalignment. Along with this case study, some classification of disturbance rejection control algorithm with the structure of control plant is discussed.

Date: 2019
References: Add references at CitEc
Citations:

There are no downloads for this item, see the EconPapers FAQ for hints about obtaining it.

Related works:
This item may be available elsewhere in EconPapers: Search for items with the same title.

Export reference: BibTeX RIS (EndNote, ProCite, RefMan) HTML/Text

Persistent link: https://EconPapers.repec.org/RePEc:spr:spochp:978-3-030-25446-9_13

Ordering information: This item can be ordered from
http://www.springer.com/9783030254469

DOI: 10.1007/978-3-030-25446-9_13

Access Statistics for this chapter

More chapters in Springer Optimization and Its Applications from Springer
Bibliographic data for series maintained by Sonal Shukla () and Springer Nature Abstracting and Indexing ().