The Growth of Vapor Deposited Amorphous Zr65Al7.5Cu27.5-Alloy Films: Experiment and Simulation

S. G. Mayr, M. Moske and K. Samwer
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S. G. Mayr: Universität Augsburg, Institut für Physik
M. Moske: Stiftung caesar
K. Samwer: Universität Göttingen, I. Physikalisches Institut

A chapter in Lectures on Applied Mathematics, 2000, pp 233-250 from Springer

Abstract: Abstract The surface structures of amorphous Zr65Al7.5Cu27.5-alloy films prepared by ultra high vacuum physical vapor deposition are investigated with scanning tunneling microscopy to identify the major surface mechanisms for amorphous film growth. A fourier analysis of the STM images shows that curvature induced surface diffusion and a non-smoothing surface mechanism is present. Numerical simulations using a Monte-Carlo and a continuum model which includes adatom concentration triggered surface diffusion as additional coarsing mechanism are in excellent agreement with the experimental results.

Keywords: Ultra High Vacuum; Amorphous Film; Increase Film Thickness; Greyscale Image; Measure Film Thickness (search for similar items in EconPapers)
Date: 2000
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Persistent link: https://EconPapers.repec.org/RePEc:spr:sprchp:978-3-642-59709-1_16

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DOI: 10.1007/978-3-642-59709-1_16

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