Investigating stress and strain due to operational information systems

Anuragini Shirish (), Shalini Chandra and Shirish C. Srivastava
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Anuragini Shirish: LITEM - Laboratoire en Innovation, Technologies, Economie et Management (EA 7363) - UEVE - Université d'Évry-Val-d'Essonne - TEM - Télécom Ecole de Management, IMT-BS - DSI - Département Systèmes d'Information - TEM - Télécom Ecole de Management - IMT - Institut Mines-Télécom [Paris] - IMT-BS - Institut Mines-Télécom Business School - IMT - Institut Mines-Télécom [Paris]
Shalini Chandra: SPJ - S P Jain School of Global Management (.)
Shirish C. Srivastava: HEC Paris - Recherche - Hors Laboratoire - HEC Paris - Ecole des Hautes Etudes Commerciales

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Abstract: Despite the wealth of research examining the influence of technostress on job outcomes, the mechanisms through which technostress generates strain to impact job outcomes is not clear. Grounding our arguments in the theory of threat bias, we investigate the mechanisms explaining this important relationship and delineate useful implications.

Keywords: Organizational technologies; Technostress (search for similar items in EconPapers)
Date: 2017-05-05
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Published in POMS 2017 : 28th Production and Operations Management Society Annual Conference, May 2017, Seattle, Washington, United States

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Persistent link: https://EconPapers.repec.org/RePEc:hal:journl:hal-02374108

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