Examining the influence of operational technostress on innovation

Shirish C. Srivastava, Shalini Chandra and Anuragini Shirish ()
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Shirish C. Srivastava: HEC Paris - Recherche - Hors Laboratoire - HEC Paris - Ecole des Hautes Etudes Commerciales
Shalini Chandra: SPJ - S P Jain School of Global Management (.)
Anuragini Shirish: IMT-BS - DSI - Département Systèmes d'Information - TEM - Télécom Ecole de Management - IMT - Institut Mines-Télécom [Paris] - IMT-BS - Institut Mines-Télécom Business School - IMT - Institut Mines-Télécom [Paris]

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Abstract: Technostress, or the stress generated in employees because of using everyday operational technologies in organizations can influence their innovation performance. Grounding our research in ‘Transactional Model of Stress and Coping', we examine the linear as well as non-linear relationships between technostress creators and employee innovation and delineate useful implications.

Keywords: Technostress (search for similar items in EconPapers)
Date: 2016-05-06
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Published in POMS 2016 : 27th Production and Operations Management Society Annual Conference, May 2016, Orlando, Florida, United States

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Persistent link: https://EconPapers.repec.org/RePEc:hal:journl:hal-02332237

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