Near-field sub-diffraction photolithography with an elastomeric photomask

Sangyoon Paik, Gwangmook Kim, Sehwan Chang, Sooun Lee, Dana Jin, Kwang-Yong Jeong, I Sak Lee, Jekwan Lee, Hongjae Moon, Jaejun Lee, Kiseok Chang, Su Seok Choi, Jeongmin Moon, Soonshin Jung, Shinill Kang, Wooyoung Lee, Heon-Jin Choi, Hyunyong Choi, Hyun Jae Kim, Jae-Hyun Lee, Jinwoo Cheon, Miso Kim, Jaemin Myoung, Hong-Gyu Park and Wooyoung Shim ()
Additional contact information
Sangyoon Paik: Yonsei University
Gwangmook Kim: Yonsei University
Sehwan Chang: Korea University
Sooun Lee: Yonsei University
Dana Jin: Yonsei University
Kwang-Yong Jeong: Korea University
I Sak Lee: Yonsei University
Jekwan Lee: Seoul National University
Hongjae Moon: Yonsei University
Jaejun Lee: Yonsei University
Kiseok Chang: LG Display
Su Seok Choi: Pohang University of Science and Technology (POSTECH)
Jeongmin Moon: LG Display
Soonshin Jung: LG Display
Shinill Kang: Yonsei University
Wooyoung Lee: Yonsei University
Heon-Jin Choi: Yonsei University
Hyunyong Choi: Seoul National University
Hyun Jae Kim: Yonsei University
Jae-Hyun Lee: Institute for Basic Science (IBS)
Jinwoo Cheon: Institute for Basic Science (IBS)
Miso Kim: Korea Research Institute of Standards and Science (KRISS)
Jaemin Myoung: Yonsei University
Hong-Gyu Park: Korea University
Wooyoung Shim: Yonsei University

Nature Communications, 2020, vol. 11, issue 1, 1-13

Abstract: Abstract Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10th of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions.

Date: 2020
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DOI: 10.1038/s41467-020-14439-1

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