All-dielectric metasurface for high-performance structural color

Wenhong Yang, Shumin Xiao (), Qinghai Song, Yilin Liu, Yunkai Wu, Shuai Wang, Jie Yu, Jiecai Han and Din-Ping Tsai ()
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Wenhong Yang: Harbin Institute of Technology, Shenzhen
Shumin Xiao: Harbin Institute of Technology, Shenzhen
Qinghai Song: Harbin Institute of Technology, Shenzhen
Yilin Liu: Harbin Institute of Technology, Shenzhen
Yunkai Wu: Harbin Institute of Technology, Shenzhen
Shuai Wang: Harbin Institute of Technology, Shenzhen
Jie Yu: Harbin Institute of Technology, Shenzhen
Jiecai Han: Harbin Institute of Technology
Din-Ping Tsai: The Hong Kong Polytechnic University

Nature Communications, 2020, vol. 11, issue 1, 1-8

Abstract: Abstract The achievement of structural color has shown advantages in large-gamut, high-saturation, high-brightness, and high-resolution. While a large number of plasmonic/dielectric nanostructures have been developed for structural color, the previous approaches fail to match all the above criterion simultaneously. Herein we utilize the Si metasurface to demonstrate an all-in-one solution for structural color. Due to the intrinsic material loss, the conventional Si metasurfaces only have a broadband reflection and a small gamut of 78% of sRGB. Once they are combined with a refractive index matching layer, the reflection bandwidth and the background reflection are both reduced, improving the brightness and the color purity significantly. Consequently, the experimentally demonstrated gamut has been increased to around 181.8% of sRGB, 135.6% of Adobe RGB, and 97.2% of Rec.2020. Meanwhile, high refractive index of silicon preserves the distinct color in a pixel with 2 × 2 array of nanodisks, giving a diffraction-limit resolution.

Date: 2020
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DOI: 10.1038/s41467-020-15773-0

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