Inducing and tuning Kondo screening in a narrow-electronic-band system
Shiwei Shen,
Chenhaoping Wen,
Pengfei Kong,
Jingjing Gao,
Jianguo Si,
Xuan Luo,
Wenjian Lu,
Yuping Sun,
Gang Chen and
Shichao Yan ()
Additional contact information
Shiwei Shen: ShanghaiTech University
Chenhaoping Wen: ShanghaiTech University
Pengfei Kong: ShanghaiTech University
Jingjing Gao: Institute of Solid State Physics, HFIPS, Chinese Academy of Sciences
Jianguo Si: Institute of Solid State Physics, HFIPS, Chinese Academy of Sciences
Xuan Luo: Institute of Solid State Physics, HFIPS, Chinese Academy of Sciences
Wenjian Lu: Institute of Solid State Physics, HFIPS, Chinese Academy of Sciences
Yuping Sun: Institute of Solid State Physics, HFIPS, Chinese Academy of Sciences
Gang Chen: The University of Hong Kong
Shichao Yan: ShanghaiTech University
Nature Communications, 2022, vol. 13, issue 1, 1-7
Abstract:
Abstract Although the single-impurity Kondo physics has already been well understood, the understanding of the Kondo lattice where a dense array of local moments couples to the conduction electrons is still far from complete. The ability of creating and tuning the Kondo lattice in non-f-electron systems will be great helpful for further understanding the Kondo lattice behavior. Here we show that the Pb intercalation in the charge-density-wave-driven narrow-electronic-band system 1T-TaS2 induces a transition from the insulating gap to a sharp Kondo resonance in the scanning tunneling microscopy measurements. It results from the Kondo screening of the localized moments in the 13-site Star-of-David clusters of 1T-TaS2. As increasing the Pb concentration, the narrow electronic band derived from the localized electrons shifts away from the Fermi level and the Kondo resonance peak is gradually suppressed. Our results pave the way for creating and tuning many-body electronic states in layered narrow-electronic-band materials.
Date: 2022
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Persistent link: https://EconPapers.repec.org/RePEc:nat:natcom:v:13:y:2022:i:1:d:10.1038_s41467-022-29891-4
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DOI: 10.1038/s41467-022-29891-4
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