Tellurium-assisted growth of large-scale atom-thin insulating amorphous carbon on insulating substrates

Ya Deng, Zihao Wang, Zhili Hu, Ang Li, Xin Zhou, Zhaolong Chen, Xingli Wang, Jiawei Liu, Kongyang Yi, Dundong Yuan, Xiaowei Wang, Peikun Zhang, Chao Zhu, Xiaoxu Zhao, Wei Ma, Yao Wu, Ruihuan Duan, Qundong Fu, Jiefu Yang, Xiuxian Zhou, Mengyao Cao, Chao Zhu, Beng Kang Tay, Jian Zhang, Mickael Lucien Perrin, Wu Zhou (), Zhuhua Zhang (), Kostya S. Novoselov () and Zheng Liu ()
Additional contact information
Ya Deng: Nanyang Technological University
Zihao Wang: National University of Singapore
Zhili Hu: Nanjing University of Aeronautics and Astronautics
Ang Li: University of Chinese Academy of Sciences
Xin Zhou: Nanyang Technological University
Zhaolong Chen: National University of Singapore
Xingli Wang: Nanyang Technological University
Jiawei Liu: National University of Singapore
Kongyang Yi: Nanyang Technological University
Dundong Yuan: Southeast University
Xiaowei Wang: Chinese Academy of Sciences
Peikun Zhang: Nanjing University of Aeronautics and Astronautics
Chao Zhu: Nanyang Technological University
Xiaoxu Zhao: Peking University
Wei Ma: Nanyang Technological University
Yao Wu: Nanyang Technological University
Ruihuan Duan: Nanyang Technological University
Qundong Fu: Nanyang Technological University
Jiefu Yang: Nanyang Technological University
Xiuxian Zhou: Nanyang Technological University
Mengyao Cao: Nanyang Technological University
Chao Zhu: Southeast University
Beng Kang Tay: Nanyang Technological University
Jian Zhang: University of Chinese Academy of Sciences
Mickael Lucien Perrin: Swiss Federal Laboratories for Materials Science and Technology
Wu Zhou: University of Chinese Academy of Sciences
Zhuhua Zhang: Nanjing University of Aeronautics and Astronautics
Kostya S. Novoselov: National University of Singapore
Zheng Liu: Nanyang Technological University

Nature Communications, 2025, vol. 16, issue 1, 1-9

Abstract: Abstract Monolayer amorphous carbon (a-C), an atom-thin two-dimensional (2D) carbon amorphous material, has attracted significant attention due to its structural and transport properties. Here, we report a chemical vapor deposition (CVD) approach for directly synthesizing monolayer a-C films on insulating substrates, achieving high control over their size, thickness, and fabrication. The synthesized films exhibit a complete coverage over a 2-inch wafer, with high uniformity. Our theoretical analysis reveals the critical role of tellurium in promoting the growth of monolayer a-C on the substrate. Moreover, quantum tunneling measurements at liquid helium temperature were conducted on the a-C films, confirming the samples’ homogeneity and their insulating behavior. This work provides a promising strategy for direct synthesis of atom-thin insulating amorphous materials and deepens our understanding of quantum phenomena and electronic properties in low-dimensional disordered materials.

Date: 2025
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DOI: 10.1038/s41467-025-63872-7

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