Numerical Simulation and Control of Industrial Crystal Growth Processes

Karl-Heinz Hoffmann, Axel Voigt and Michael Metzger
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Karl-Heinz Hoffmann: nanotechnology — crystal growth, research center ca e s ar
Axel Voigt: nanotechnology — crystal growth, research center ca e s ar
Michael Metzger: Institute VI, University Erlangen-Nürnberg, Department of Material Science

A chapter in Mathematics — Key Technology for the Future, 2003, pp 331-342 from Springer

Abstract: Abstract This project is carried out jointly by the Crystal Growth Laboratory at the Chair of Material Science VI at the University of Erlangen (Prof. G. Müller) and the Chair of Applied Mathematics at the Technical University of Munich (Prof. K.-H. Hoffmann) with the support of the companies Korth Kristalle GmbH and Preiberger Compound Materials GmbH. The goal of the project is the development of proper numerical models for optimisation and control of industrial crystal growth processes. To this end the research group concentrates on the numerical treatment, simulation and optimal control of techniques for growing high quality single and compound semiconductor crystals. The result of this project is the flexible and efficient computer code CrysVUn that is today successfully used to optimise industrial growth processes.

Keywords: Thermoelastic Stress; GaAs Crystal; Boric Oxide; Axial Temperature Gradient; Finite Volume Technique (search for similar items in EconPapers)
Date: 2003
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Persistent link: https://EconPapers.repec.org/RePEc:spr:sprchp:978-3-642-55753-8_27

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DOI: 10.1007/978-3-642-55753-8_27

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