Surface Structures of Phosphorus and Indium on Si(111)

F. P. Netzer (), L. Vitali, J. Kraft and M. G. Ramesy
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F. P. Netzer: Institut für Experimentalphysik, Karl-Franzens-Universität Graz, A-8010 Graz, Austria
L. Vitali: Institut für Experimentalphysik, Karl-Franzens-Universität Graz, A-8010 Graz, Austria
J. Kraft: Institut für Experimentalphysik, Karl-Franzens-Universität Graz, A-8010 Graz, Austria
M. G. Ramesy: Institut für Experimentalphysik, Karl-Franzens-Universität Graz, A-8010 Graz, Austria

Surface Review and Letters (SRL), 1998, vol. 05, issue 01, 69-76

Abstract: The interaction of vapor phase P2with the${\rm Si}(111)\mbox{-}(\sqrt{7}\times\sqrt{3})\mbox{-}{\rm In}$monolayer surface at room temperature and elevated temperature has been monitored by scanning tunneling microscopy (STM) and spectroscopy (STS) in conjunction with Auger electron spectroscopy and low-energy electron diffraction (LEED). The surface rection can be readily followed by STM because of the very different contrast of the reacted areas in the STM images. The reaction develops around overlayer defects at room temperature and appears to be diffusion-limited, whereas at 300°C the reaction is initiated at the step edges, from which the reaction front progresses onto the lower terrace areas. At elevated temperature several ordered surface reconstructions, showing different STS fingerprints, are detected on the P–In/Si(111) surfaces, which are associated tentatively with P- and Si-terminated structures and an ordered InP phase.

Date: 1998
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DOI: 10.1142/S0218625X98000153

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