The Overlayer Structure on the Si(001)-(2×3)-AgSurface Determined by X-ray Photoelectron Diffraction

M. Shimomura, T. Abukawa, M. Higa, Masao Nakamura, S. M. Shivaprasad, H. W. Yeom, S. Suzuki, S. Sato, J. Tani and S. Kono
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M. Shimomura: Research Institute for Scientific Measurements, Tohoku University, Sendai 980-8577, Japan
T. Abukawa: Research Institute for Scientific Measurements, Tohoku University, Sendai 980-8577, Japan
M. Higa: Research Institute for Scientific Measurements, Tohoku University, Sendai 980-8577, Japan
S. M. Shivaprasad: Research Institute for Scientific Measurements, Tohoku University, Sendai 980-8577, Japan
H. W. Yeom: Research Institute for Scientific Measurements, Tohoku University, Sendai 980-8577, Japan;
S. Suzuki: Research Institute for Scientific Measurements, Tohoku University, Sendai 980-8577, Japan;
S. Sato: Research Institute for Scientific Measurements, Tohoku University, Sendai 980-8577, Japan;
J. Tani: Research Institute for Scientific Measurements, Tohoku University, Sendai 980-8577, Japan;
S. Kono: Research Institute for Scientific Measurements, Tohoku University, Sendai 980-8577, Japan

Surface Review and Letters (SRL), 1998, vol. 05, issue 05, 953-958

Abstract: X-ray photoelectron diffraction (XPD) patterns of Ag 3d electrons from a single domain Si(001)-(2×3)-Ag surface were examined. Single scattering cluster and multiple scattering cluster simulations of the Ag 3d XPD patterns indicate an overlayer that contains four Ag atoms aligned almost linearly along the threefold direction in the unit cell on the Si(001) surface. The four-Ag-atom arrangement is discussed in the light of other information obtained by STM, LEEM and photoemission studies, finding it very feasible.

Date: 1998
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DOI: 10.1142/S0218625X98001286

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