Highly Angle-Resolved X-Ray Photoelectron Diffraction from Solid Surfaces

K. Tamura, S. Shiraki, H. Ishii, M. Owari and Y. Nihei
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K. Tamura: Institute of Industrial Science, the University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan
S. Shiraki: Institute of Industrial Science, the University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan
H. Ishii: Institute of Industrial Science, the University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan
M. Owari: Environmental Science Center, the University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-0033, Japan
Y. Nihei: Faculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba, 278-8510, Japan

Surface Review and Letters (SRL), 2003, vol. 10, issue 02n03, 257-261

Abstract: We have carried out the highly angle-resolved X-ray photoelectron diffraction (XPED) measurements by using the input-lens system for restriction of the detection angle. In the input-lens system, high angular resolution and high throughput are accomplished by placing an aperture not on the image plane but on the diffraction plane of electron optics. The aperture sizes (ϕ 4 mm, ϕ 2 mm, ϕ 0.5 mm, ϕ 0.25 mm) correspond to the angular resolutions (± 0.6°, ± 0.3°, ± 0.08°, ± 0.04°) respectively. Highly angle-resolved Ge3d XPED patterns from Ge(111) obtained by the angle-resolving system contain fine structure such as Kikuchi patterns. The fine structure was reproduced by multiple scattering cluster calculations.

Date: 2003
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DOI: 10.1142/S0218625X03004974

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