ADSORPTION AND REACTION OF NITRIC OXIDE ONSi(111)-AuSURFACES

T. Nishimura, K. Hattori (), K. Kataoka, Y. Shimamoto and H. Daimon
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T. Nishimura: Graduate School of Materials Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan
K. Hattori: Graduate School of Materials Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan;
K. Kataoka: Graduate School of Materials Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan
Y. Shimamoto: Graduate School of Materials Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan
H. Daimon: Graduate School of Materials Science, Nara Institute of Science and Technology, Takayama 8916-5, Ikoma, Nara 630-0192, Japan;

Surface Review and Letters (SRL), 2006, vol. 13, issue 02n03, 191-196

Abstract: We studied adsorption and reaction of nitric oxide onSi(111)7 × 7,5 × 2-Au,$\alpha-\sqrt{3},\times \sqrt{3}-{\rm Au}$,$\beta-\sqrt{3} \times \sqrt{3}-{\rm Au}$, and6 × 6-Ausurfaces with low-energy electron diffraction, Auger electron spectroscopy, and scanning tunneling microscopy (STM). We found that NO gas reacts most strongly with the7 × 7surface, strongly with the5 × 2-Ausurface, and little with the otherSi(111)-Ausurfaces. STM results indicated that the NO exposure removes adatoms and erodes the row structure on the5 × 2-Ausurface at room temperature.

Keywords: Nitric oxide; silicon; gold; chemical reactions; Auger electron spectroscopy (AES); scanning tunneling microscopy (STM); 68.47.Fg; 82.37.Np; 82.80.Pv; 61.14.Hg; 68.37.Ef (search for similar items in EconPapers)
Date: 2006
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DOI: 10.1142/S0218625X06008037

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