STRUCTURAL PROPERTIES OFAlNFILMS WITH OXYGEN CONTENT DEPOSITED BY REACTIVE MAGNETRON SPUTTERING: XRD AND XPS CHARACTERIZATION

Manuel García-Méndez (), Santos Morales-Rodríguez (), Sadasivan Shaji, Bindu Krishnan and Pascual Bartolo-Pérez ()
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Manuel García-Méndez: Centro de Investigación en Ciencias Físico Matemáticas, Facultad de Ciencias Físico-Matemáticas de la UANL, Manuel L. Barragán S/N, Cd. Universitaria, San Nicolás de los Garza, N.L.C.P. 66450, Mexico;
Santos Morales-Rodríguez: Facultad de Ingeniería Mecánica y Eléctrica de la UAC, avenida Barranquillas S/N Col. Guadalupe, C.P. 25750, Monclova, Coah, Mexico
Sadasivan Shaji: Facultad de Ingeniería Mecánica y Eléctrica de la UANL, Manuel L. Barragán S/N, Cd. Universitaria, San Nicolás de los Garza, N.L.C.P. 66450, Mexico;
Bindu Krishnan: Facultad de Ingeniería Mecánica y Eléctrica de la UANL, Manuel L. Barragán S/N, Cd. Universitaria, San Nicolás de los Garza, N.L.C.P. 66450, Mexico;
Pascual Bartolo-Pérez: Cinvestav-IPN, Unidad Méridaî, Departamento de Física Aplicadaî, Km. 6 Antigua Carr. a Progreso, C.P. 97310 Mérida, Yuc., Mexico

Surface Review and Letters (SRL), 2011, vol. 18, issue 01n02, 23-31

Abstract: A set of aluminium nitride(AlN)and oxidizedAlN(AlNO)thin films were grown with the technique of direct current (dc) reactive magnetron sputtering. The main purpose of this investigation is to explore the influence of the oxygen on the structural properties ofAlNandAlNOfilms. The crystalline properties and chemical identification of phases were studied by X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. Electrical properties were analyzed from I-V measurements. It was found that films crystallized under theAlNwürzite structure and presented a polycrystalline preferential growth along [0001] direction, perpendicular to substrate. Small amounts of secondary aluminium oxide phases were detected too. The oxide phases can induce defects, which can alter crystallinity of films.

Keywords: AlNthin films; crystal morphology; oxynitrides; reactive magnetron sputtering (search for similar items in EconPapers)
Date: 2011
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DOI: 10.1142/S0218625X1101445X

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