CHARACTERIZATION OF CuO THIN FILMS DEPOSITION ON POROUS SILICON BY SPRAY PYROLYSIS

Khawla Khashan (), Azhar I. Hassan and Ali J. Addie
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Azhar I. Hassan: Laser Branch, Department of Applied Sciences, University of Technology, Iraq
Ali J. Addie: #x2020;Center of Advanced Materials, Ministry of Science and Technology, Baghdad, Iraq

Surface Review and Letters (SRL), 2016, vol. 23, issue 05, 1-5

Abstract: CuO thin films on porous silicon (PSi) substrates were prepared via spray pyrolysis method. The structural, optical and electrical properties of the films and the heterojunctions were characterized by X-ray diffraction (XRD), scanning electron microscope (SEM), atomic force microscope (AFM) and UV-Vis spectrophotometer. XRD results show that the film is polycrystalline and have a monoclinic crystal structure. Optical measurement indicates that the films had a low transmittance at the visible range and an optical bandgap of 2.2eV. High rectification was achieved with a maximum photoresponsivity of about 0.59A/W at 400nm, so that the CuO/PSi heterojunction may act as a good candidate for the fabrication of an efficient photodiode.

Keywords: CuO thin films; spray pyrolysis; CuO on PSi; porous silicon (search for similar items in EconPapers)
Date: 2016
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DOI: 10.1142/S0218625X1650044X

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