High thermal stability Si-Al based N-carrier for efficient and stable chemical looping ammonia generation

Chuhao Xiong, Ye Wu, Mingqian Feng, Jing Fang, Dong Liu, Laihong Shen, Morris D. Argyle, Khaled A. M. Gasem and Maohong Fan

Applied Energy, 2022, vol. 323, issue C, No S0306261922008406

Abstract: Chemical looping ammonia generation (CLAG) is a promising NH3 production technology due to its potential for high yield of NH3 and low CO2 emission footprint. However, the stabilities of the existing N-carriers are problematic during the cyclic N-sorption/desorption. This research was designed to overcome that challenge through use of elemental doping and depositing the N-carrier on a support. The experimental results show that the N-sorption/desorption performance of γ-Al2O3 N-carriers decreased with cycling due to the deterioration of the pore structure and phase transformation. A Si-modified alumina-based N-carrier, with a Si: Al molar ratio of 1:20 prepared by co-precipitation, was much more resistant to high-temperature phase transition and collapse of pore structure, resulting in highly stable cyclic N-sorption/desorption performance. Use of ZrO2 as a support for the Si-modified Al-based N-carrier further reduced NH3 decomposition and thus increased the NH3 yield and selectivity by 85.6% and 53.6% compared to that obtained with the pure γ-Al2O3 N-carrier.

Keywords: Chemical looing ammonia generation (CLAG); Cyclic N-sorption/desorption performance; Si-modified alumina-based N-carrier; High thermal stability; Catalytic N-carrier; Zirconia support (search for similar items in EconPapers)
Date: 2022
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Citations: View citations in EconPapers (2)

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DOI: 10.1016/j.apenergy.2022.119519

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