Stability of a Cu2O photoelectrode in an electrochemical cell and the performances of the photoelectrode coated with Au and SiO thin films

K. A. Khan

Applied Energy, 2000, vol. 65, issue 1-4, 59-66

Abstract: The photoresponse and stability of Cu2O films have been examined. Thermodynamic calculations showed that, for Cu2O, there exists a region of chemical stability potential between -0.218 and -0.489 V(S.C.E) for oxidation and reduction potential, respectively. In an aqueous solution, a deterioration in power output occurs at a rate of 50% per day. To stabilize the photocurrent, thin deposits of Au and SiO films onto Cu2O electrodes have been studied. For the Au deposition, the photocurrent was either quenched or reduced. For the SiO deposited photoelectrode, its effect was to decrease the quantum efficiency of Cu2O. However, the deposition does not affect the band gap at 2.11 eV (which ensued for an uncoated sample).

Keywords: Cuprous; oxide; Stability; Photocurrent; Electrochemical; cell; Photoelectrode; Performances; Coated; films (search for similar items in EconPapers)
Date: 2000
References: View complete reference list from CitEc
Citations: View citations in EconPapers (1)

Downloads: (external link)
http://www.sciencedirect.com/science/article/pii/S0306-2619(99)00060-4
Full text for ScienceDirect subscribers only

Related works:
This item may be available elsewhere in EconPapers: Search for items with the same title.

Export reference: BibTeX RIS (EndNote, ProCite, RefMan) HTML/Text

Persistent link: https://EconPapers.repec.org/RePEc:eee:appene:v:65:y:2000:i:1-4:p:59-66

Ordering information: This journal article can be ordered from
http://www.elsevier.com/wps/find/journaldescription.cws_home/405891/bibliographic
http://www.elsevier. ... 405891/bibliographic

Access Statistics for this article

Applied Energy is currently edited by J. Yan

More articles in Applied Energy from Elsevier
Bibliographic data for series maintained by Catherine Liu ().