Reentrant oscillation in kinetic thin-film deposition

Rong-Fu Xiao

Physica A: Statistical Mechanics and its Applications, 1996, vol. 229, issue 2, 236-243

Abstract: We have studied the origin of reentrant growth oscillation in kinetic thin-film deposition on stepped surfaces using a Monte Carlo simulation. The results show that reentrant oscillation occurs as a result of growth modes competition between two-dimension-nucleation growth and step-flow growth due to a variation of surface-diffusion-length with deposition temperature, and that it is a natural phenomenon in non-equilibrium thin-film deposition on a substrate with a permanent step source.

Keywords: Monte Carlo simulation; Surface growth morphologies; Surface roughening and surface diffusion (search for similar items in EconPapers)
Date: 1996
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Persistent link: https://EconPapers.repec.org/RePEc:eee:phsmap:v:229:y:1996:i:2:p:236-243

DOI: 10.1016/0378-4371(96)00013-1

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