Kinetic roughening in etched Si

M.E.r Dotto and M.u Kleinke

Physica A: Statistical Mechanics and its Applications, 2001, vol. 295, issue 1, 149-153

Abstract: In this work, surface morphology of Si etched surfaces generated with distinct physical constrains for attack, has been investigated by atomic force microscope (AFM). Statistical properties measured from AFM images prove that these surfaces present self-affine behavior; and also suggest that Si chemical attacks can be described as a 2+1 percolation inner random medium with quenched noise.

Keywords: AFM; Scaling; Percolation; Etched surfaces and morphology (search for similar items in EconPapers)
Date: 2001
References: View complete reference list from CitEc
Citations: View citations in EconPapers (1)

Downloads: (external link)
http://www.sciencedirect.com/science/article/pii/S0378437101000681
Full text for ScienceDirect subscribers only. Journal offers the option of making the article available online on Science direct for a fee of $3,000

Related works:
This item may be available elsewhere in EconPapers: Search for items with the same title.

Export reference: BibTeX RIS (EndNote, ProCite, RefMan) HTML/Text

Persistent link: https://EconPapers.repec.org/RePEc:eee:phsmap:v:295:y:2001:i:1:p:149-153

DOI: 10.1016/S0378-4371(01)00068-1

Access Statistics for this article

Physica A: Statistical Mechanics and its Applications is currently edited by K. A. Dawson, J. O. Indekeu, H.E. Stanley and C. Tsallis

More articles in Physica A: Statistical Mechanics and its Applications from Elsevier
Bibliographic data for series maintained by Catherine Liu ().