New cellular automaton designed to simulate epitaxial films growth

Rafał Kosturek and Krzysztof Malarz

Physica A: Statistical Mechanics and its Applications, 2005, vol. 345, issue 3, 538-546

Abstract: In this paper, a simple (2+1) solid-on-solid model of the epitaxial films growth based on random deposition followed by breaking particle–particle lateral bonds and particles surface diffusion is introduced. The influence of the critical number of the particle–particle lateral bonds z and the deposition rate on the surface roughness dynamics and possible surface morphology anisotropy is presented. The roughness exponent α and the growth exponent β are (0.863,0.357), (0.215,0.123), (0.101,0.0405) and (0.0718,0.0228) for z=1, 2, 3 and 4, respectively.

Keywords: Anisotropy; Computer simulations; Molecular beam epitaxy; Monte Carlo methods; Roughness; Solid-on-solid approximation; Surface growth; Surface morphology and topology (search for similar items in EconPapers)
Date: 2005
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Persistent link: https://EconPapers.repec.org/RePEc:eee:phsmap:v:345:y:2005:i:3:p:538-546

DOI: 10.1016/j.physa.2004.08.013

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