A random rule model of surface growth

Bernardo A. Mello

Physica A: Statistical Mechanics and its Applications, 2015, vol. 419, issue C, 762-767

Abstract: Stochastic models of surface growth are usually based on randomly choosing a substrate site to perform iterative steps, as in the etching model, Mello et al. (2001) [5]. In this paper I modify the etching model to perform sequential, instead of random, substrate scan. The randomicity is introduced not in the site selection but in the choice of the rule to be followed in each site. The change positively affects the study of dynamic and asymptotic properties, by reducing the finite size effect and the short-time anomaly and by increasing the saturation time. It also has computational benefits: better use of the cache memory and the possibility of parallel implementation.

Keywords: Stochastic surface models; Etching model; Short time anomaly; Finite length effect (search for similar items in EconPapers)
Date: 2015
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Citations: View citations in EconPapers (1)

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Persistent link: https://EconPapers.repec.org/RePEc:eee:phsmap:v:419:y:2015:i:c:p:762-767

DOI: 10.1016/j.physa.2014.10.064

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