Resistance Distance in Potting Networks

Jiaqi Fan, Jiali Zhu, Li Tian and Qin Wang

Physica A: Statistical Mechanics and its Applications, 2020, vol. 540, issue C

Abstract: On a resistor network, the resistance distance is the effective resistance ruv between two nodes u,v of the network. In this paper, we study a family of self-similar and symmetric networks named potting networks and obtain a recursion formula to calculate resistance distances.

Keywords: Fractal network; Resistance distance; Potting network (search for similar items in EconPapers)
Date: 2020
References: View references in EconPapers View complete reference list from CitEc
Citations: View citations in EconPapers (3)

Downloads: (external link)
http://www.sciencedirect.com/science/article/pii/S037843711931725X
Full text for ScienceDirect subscribers only. Journal offers the option of making the article available online on Science direct for a fee of $3,000

Related works:
This item may be available elsewhere in EconPapers: Search for items with the same title.

Export reference: BibTeX RIS (EndNote, ProCite, RefMan) HTML/Text

Persistent link: https://EconPapers.repec.org/RePEc:eee:phsmap:v:540:y:2020:i:c:s037843711931725x

DOI: 10.1016/j.physa.2019.123053

Access Statistics for this article

Physica A: Statistical Mechanics and its Applications is currently edited by K. A. Dawson, J. O. Indekeu, H.E. Stanley and C. Tsallis

More articles in Physica A: Statistical Mechanics and its Applications from Elsevier
Bibliographic data for series maintained by Catherine Liu ().