Optimization of the growth rate of electrochromic WO3 coatings, in-situ grown by chemical vapor deposition at atmospheric pressure

D Gogova, G Stoyanov and K.a Gesheva

Renewable Energy, 1996, vol. 8, issue 1, 546-550

Abstract: Electrochromic WO3 thin films on ITO-covered glass substrates are grown by Atmospheric Pressure Chemical Vapor Deposition (APCVD) using W(CO)6 as precursor. The process is pyrolytical decomposition of W(CO)6 in the presence of oxygen gas atmosphere. The growth rate was found to depend strongly on the oxygen flow-rate, as well as on the argon flow-rate through the precursor chamber. The optimization of these process parameters leads to high growth rates in the order of 30 Å/sec. Structural studies by Reflection High Energy Electron Diffraction (RHEED) and SEM show that the films are polycrystalline WO3 with a certain degree of texturing.

Keywords: Electrochromic; chemical vapor deposition; thin films; tungsten trioxide (WO3); structure; transmittance (search for similar items in EconPapers)
Date: 1996
References: View complete reference list from CitEc
Citations:

Downloads: (external link)
http://www.sciencedirect.com/science/article/pii/0960148196889154
Full text for ScienceDirect subscribers only

Related works:
This item may be available elsewhere in EconPapers: Search for items with the same title.

Export reference: BibTeX RIS (EndNote, ProCite, RefMan) HTML/Text

Persistent link: https://EconPapers.repec.org/RePEc:eee:renene:v:8:y:1996:i:1:p:546-550

DOI: 10.1016/0960-1481(96)88915-4

Access Statistics for this article

Renewable Energy is currently edited by Soteris A. Kalogirou and Paul Christodoulides

More articles in Renewable Energy from Elsevier
Bibliographic data for series maintained by Catherine Liu ().