High-efficiency multilevel zone plates for keV X-rays

E. Di Fabrizio (), F. Romanato, M. Gentili, S Cabrini, B. Kaulich, J. Susini and R. Barrett
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E. Di Fabrizio: TASC-INFM (National Institute for the Physics of Matter), Elettra Synchrotron Light Source, Lilit Beam-line SS14 km 163.5, Area Science Park
F. Romanato: TASC-INFM (National Institute for the Physics of Matter), Elettra Synchrotron Light Source, Lilit Beam-line SS14 km 163.5, Area Science Park
M. Gentili: Istituto di Elettronica dello Stato Solido
S Cabrini: Istituto di Elettronica dello Stato Solido
B. Kaulich: X-Ray Microscopy Beamline, European Synchrotron Radiation Facility
J. Susini: X-Ray Microscopy Beamline, European Synchrotron Radiation Facility
R. Barrett: X-Ray Microscopy Beamline, European Synchrotron Radiation Facility

Nature, 1999, vol. 401, issue 6756, 895-898

Abstract: Abstract The development of high brilliance X-ray sources coupled with advances in manufacturing technologies has led to significant improvements in submicrometre probes for spectroscopy, diffraction and imaging applications. The generation of a small beam spot size is commonly based on three principles1: total reflection (as used in optical elements involving mirrors or capillaries), refraction (such as in refractive lenses2) and diffraction. The latter effect is employed in Bragg–Fresnel or Soret lenses, commonly known as Fresnel zone plate lenses. These lenses currently give the best spatial resolution, but are traditionally limited to rather soft X-rays—at high energies, their use is still limited by their efficiency. Here we report the fabrication of high-efficiency, high-contrast gold and nickel multistep (quaternary) Fresnel zone plates using electron beam lithography. We achieve a maximum efficiency of 55% for the nickel plate at 7 keV. In addition to their high efficiency, the lenses offer the advantages of low background signal and effective reduction of unwanted diffraction orders. We anticipate that these lenses should have a significant impact on techniques such as microscopy3, micro-fluorescence4 and micro-diffraction5, which require medium resolution (500–100 nm) and high flux at fixed energies.

Date: 1999
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DOI: 10.1038/44791

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