A three-dimensional optical photonic crystal with designed point defects

Minghao Qi (), Elefterios Lidorikis, Peter T. Rakich, Steven G. Johnson, J. D. Joannopoulos, Erich P. Ippen and Henry I. Smith
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Minghao Qi: Massachusetts Institute of Technology
Elefterios Lidorikis: Massachusetts Institute of Technology
Peter T. Rakich: Massachusetts Institute of Technology
Steven G. Johnson: Massachusetts Institute of Technology
J. D. Joannopoulos: Massachusetts Institute of Technology
Erich P. Ippen: Massachusetts Institute of Technology
Henry I. Smith: Massachusetts Institute of Technology

Nature, 2004, vol. 429, issue 6991, 538-542

Abstract: Abstract Photonic crystals1,2,3 offer unprecedented opportunities for miniaturization and integration of optical devices. They also exhibit a variety of new physical phenomena, including suppression or enhancement of spontaneous emission, low-threshold lasing, and quantum information processing4. Various techniques for the fabrication of three-dimensional (3D) photonic crystals—such as silicon micromachining5, wafer fusion bonding6, holographic lithography7, self-assembly8,9, angled-etching10, micromanipulation11, glancing-angle deposition12 and auto-cloning13,14—have been proposed and demonstrated with different levels of success. However, a critical step towards the fabrication of functional 3D devices, that is, the incorporation of microcavities or waveguides in a controllable way, has not been achieved at optical wavelengths. Here we present the fabrication of 3D photonic crystals that are particularly suited for optical device integration using a lithographic layer-by-layer approach15. Point-defect microcavities are introduced during the fabrication process and optical measurements show they have resonant signatures around telecommunications wavelengths (1.3–1.5 µm). Measurements of reflectance and transmittance at near-infrared are in good agreement with numerical simulations.

Date: 2004
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DOI: 10.1038/nature02575

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