Solution-processed silicon films and transistors

Tatsuya Shimoda, Yasuo Matsuki, Masahiro Furusawa (), Takashi Aoki, Ichio Yudasaka, Hideki Tanaka, Haruo Iwasawa, Daohai Wang, Masami Miyasaka and Yasumasa Takeuchi
Additional contact information
Tatsuya Shimoda: Seiko Epson Corporation
Yasuo Matsuki: JSR Corporation
Masahiro Furusawa: Seiko Epson Corporation
Takashi Aoki: Seiko Epson Corporation
Ichio Yudasaka: Seiko Epson Corporation
Hideki Tanaka: Seiko Epson Corporation
Haruo Iwasawa: JSR Corporation
Daohai Wang: JSR Corporation
Masami Miyasaka: Seiko Epson Corporation
Yasumasa Takeuchi: JSR Corporation

Nature, 2006, vol. 440, issue 7085, 783-786

Abstract: Semiconductor solutions The manufacture of silicon semiconductor devices involves complicated photolithography and expensive machinery, so many researchers are seeking alternative semiconductor materials that can be handled by simple processes such as spin-coating or printing. Organic semiconductors are the most promising candidates but they still lack performance and reliability. Shimoda et al. have taken a different approach, printing a silicon transistor itself, not a substitute. They successfully fabricated polycrystalline silicon transistors by spin-coating a novel liquid precursor. This solution-based approach can also be adapted for ‘ink-jet’ printing of transistors.

Date: 2006
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DOI: 10.1038/nature04613

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