Chemical identification of individual surface atoms by atomic force microscopy

Yoshiaki Sugimoto, Pablo Pou, Masayuki Abe, Pavel Jelinek, Rubén Pérez, Seizo Morita and Óscar Custance ()
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Yoshiaki Sugimoto: Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, 565-0871 Suita, Osaka, Japan
Pablo Pou: Universidad Autónoma de Madrid, 28049 Madrid, Spain
Masayuki Abe: Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, 565-0871 Suita, Osaka, Japan
Pavel Jelinek: Institute of Physics, Academy of Sciences of the Czech Republic, Cukrovarnická 10, 1862 53, Prague, Czech Republic
Rubén Pérez: Universidad Autónoma de Madrid, 28049 Madrid, Spain
Seizo Morita: Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, 565-0871 Suita, Osaka, Japan
Óscar Custance: Graduate School of Engineering, Osaka University, 2-1 Yamada-Oka, 565-0871 Suita, Osaka, Japan

Nature, 2007, vol. 446, issue 7131, 64-67

Abstract: Name that atom Dynamic force microscopy, which works by detecting the interaction force between the oscillating tip of an atomic force microscope (AFM) and a surface, has been refined to the extent that it can achieve true atomic resolution of insulator, semiconductor and metal surfaces. In a landmark publication in this issue this technique has been used to perform the chemical identification of individual atoms in a multi-element system. The method involves precise quantification of short-range chemical forces between the probed atoms and the AFM tip, and provides a robust and general recognition tool suitable for both cryogenic and room temperature environments. The cover shows a topographic image of a surface alloy made up of silicon (red), tin (blue), and lead atoms (green) in equal proportions on a silicon (111) substrate. This atomic identification method is relevant to a wide range of research areas such as catalysis, materials science and semiconductor technology.

Date: 2007
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DOI: 10.1038/nature05530

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