Hard-tip, soft-spring lithography

Wooyoung Shim, Adam B. Braunschweig, Xing Liao, Jinan Chai, Jong Kuk Lim, Gengfeng Zheng and Chad A. Mirkin ()
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Wooyoung Shim: Northwestern University, 2220 Campus Drive
Adam B. Braunschweig: International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA
Xing Liao: Northwestern University, 2220 Campus Drive
Jinan Chai: International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA
Jong Kuk Lim: International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA
Gengfeng Zheng: International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA
Chad A. Mirkin: Northwestern University, 2220 Campus Drive

Nature, 2011, vol. 469, issue 7331, 516-520

Abstract: Lithographic tips Scanning probe techniques such as atomic-force microscopy can be readily harnessed to prepare nanoscale structures with exquisite resolution, but are not generally suitable for high-throughput patterning. Techniques based on contact printing, by contrast, offer high throughput over large areas, but cannot compete on resolution. Now, Wooyoung Shim and colleagues describe an approach that offers the best of both worlds. By attaching an array of hard, scanning-probe-like silicon tips to a flexible elastomeric substrate (similar to those used in contact printing), they are able to rapidly create arbitrary patterns with sub-50-nanometre resolution over centimetre-scale areas. This new nanolithography strategy should be suitable for a range of rapid prototyping applications in both industrial and research applications.

Date: 2011
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DOI: 10.1038/nature09697

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