Unveiling the double-well energy landscape in a ferroelectric layer

Michael Hoffmann (), Franz P. G. Fengler, Melanie Herzig, Terence Mittmann, Benjamin Max, Uwe Schroeder, Raluca Negrea, Pintilie Lucian, Stefan Slesazeck and Thomas Mikolajick
Additional contact information
Michael Hoffmann: NaMLab
Franz P. G. Fengler: NaMLab
Melanie Herzig: NaMLab
Terence Mittmann: NaMLab
Benjamin Max: Institute of Semiconductors and Microsystems, TU Dresden
Uwe Schroeder: NaMLab
Raluca Negrea: National Institute of Materials Physics
Pintilie Lucian: National Institute of Materials Physics
Stefan Slesazeck: NaMLab
Thomas Mikolajick: NaMLab

Nature, 2019, vol. 565, issue 7740, 464-467

Abstract: Abstract The properties of ferroelectric materials, which were discovered almost a century ago1, have led to a huge range of applications, such as digital information storage2, pyroelectric energy conversion3 and neuromorphic computing4,5. Recently, it was shown that ferroelectrics can have negative capacitance6–11, which could improve the energy efficiency of conventional electronics beyond fundamental limits12–14. In Landau–Ginzburg–Devonshire theory15–17, this negative capacitance is directly related to the double-well shape of the ferroelectric polarization–energy landscape, which was thought for more than 70 years to be inaccessible to experiments18. Here we report electrical measurements of the intrinsic double-well energy landscape in a thin layer of ferroelectric Hf0.5Zr0.5O2. To achieve this, we integrated the ferroelectric into a heterostructure capacitor with a second dielectric layer to prevent immediate screening of polarization charges during switching. These results show that negative capacitance has its origin in the energy barrier in a double-well landscape. Furthermore, we demonstrate that ferroelectric negative capacitance can be fast and hysteresis-free, which is important for prospective applications19. In addition, the Hf0.5Zr0.5O2 used in this work is currently the most industry-relevant ferroelectric material, because both HfO2 and ZrO2 thin films are already used in everyday electronics20. This could lead to fast adoption of negative capacitance effects in future products with markedly improved energy efficiency.

Date: 2019
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DOI: 10.1038/s41586-018-0854-z

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