EconPapers    
Economics at your fingertips  
 

Single-crystalline metal-oxide dielectrics for top-gate 2D transistors

Daobing Zeng, Ziyang Zhang, Zhongying Xue, Miao Zhang, Paul K. Chu, Yongfeng Mei, Ziao Tian () and Zengfeng Di ()
Additional contact information
Daobing Zeng: Chinese Academy of Sciences
Ziyang Zhang: Chinese Academy of Sciences
Zhongying Xue: Chinese Academy of Sciences
Miao Zhang: Chinese Academy of Sciences
Paul K. Chu: City University of Hong Kong
Yongfeng Mei: Fudan University
Ziao Tian: Chinese Academy of Sciences
Zengfeng Di: Chinese Academy of Sciences

Nature, 2024, vol. 632, issue 8026, 788-794

Abstract: Abstract Two-dimensional (2D) structures composed of atomically thin materials with high carrier mobility have been studied as candidates for future transistors1–4. However, owing to the unavailability of suitable high-quality dielectrics, 2D field-effect transistors (FETs) cannot attain the full theoretical potential and advantages despite their superior physical and electrical properties3,5,6. Here we demonstrate the fabrication of atomically thin single-crystalline Al2O3 (c-Al2O3) as a high-quality top-gate dielectric in 2D FETs. By using intercalative oxidation techniques, a stable, stoichiometric and atomically thin c-Al2O3 layer with a thickness of 1.25 nm is formed on the single-crystalline Al surface at room temperature. Owing to the favourable crystalline structure and well-defined interfaces, the gate leakage current, interface state density and dielectric strength of c-Al2O3 meet the International Roadmap for Devices and Systems requirements3,5,7. Through a one-step transfer process consisting of the source, drain, dielectric materials and gate, we achieve top-gate MoS2 FETs characterized by a steep subthreshold swing of 61 mV dec−1, high on/off current ratio of 108 and very small hysteresis of 10 mV. This technique and material demonstrate the possibility of producing high-quality single-crystalline oxides suitable for integration into fully scalable advanced 2D FETs, including negative capacitance transistors and spin transistors.

Date: 2024
References: Add references at CitEc
Citations: View citations in EconPapers (1)

Downloads: (external link)
https://www.nature.com/articles/s41586-024-07786-2 Abstract (text/html)
Access to the full text of the articles in this series is restricted.

Related works:
This item may be available elsewhere in EconPapers: Search for items with the same title.

Export reference: BibTeX RIS (EndNote, ProCite, RefMan) HTML/Text

Persistent link: https://EconPapers.repec.org/RePEc:nat:nature:v:632:y:2024:i:8026:d:10.1038_s41586-024-07786-2

Ordering information: This journal article can be ordered from
https://www.nature.com/

DOI: 10.1038/s41586-024-07786-2

Access Statistics for this article

Nature is currently edited by Magdalena Skipper

More articles in Nature from Nature
Bibliographic data for series maintained by Sonal Shukla () and Springer Nature Abstracting and Indexing ().

 
Page updated 2025-03-22
Handle: RePEc:nat:nature:v:632:y:2024:i:8026:d:10.1038_s41586-024-07786-2