COMPUTING EPITAXIAL GROWTH IN A TILTED MOCVD REACTOR BY A FINITE ELEMENT MULTIGRID METHOD

Jairo Duque ()
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Jairo Duque: Departamento de Matemáticas, Universidad del Valle, Calle 13 # 100-00, Cali, A. A. 25360, Colombia

International Journal of Modern Physics C (IJMPC), 2007, vol. 18, issue 06, 949-955

Abstract: A multigrid (MG) numerical solution procedure for a mathematical model for epitaxial growth in metalorganic chemical vapor deposition reactors is developed. The model is governed by the full compressible Navier–Stokes equations for two-dimensional (plane and axisymmetric) laminar flows extended by transport equations for the chemical species, the energy equations and the equation of state, together with boundary conditions providing information on the reactor geometry and experimental conditions. The MG numerical solution is implemented in a finite element procedure that uses the same linear finite elements to discretize both convection and diffusion fluxes by adding to the model a stabilizing term, resulting in easy implementation of the procedure. A deposition process for a model ofGaAsgrowth is calculated with our procedure showing consistency with experimental data.

Keywords: Finite element method; multigrid method; Navier–Stokes equations; MOCVD reactor; 81.10.Fq; 47.11.Fg (search for similar items in EconPapers)
Date: 2007
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DOI: 10.1142/S0129183107011054

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