Prediction of particle deposition velocity onto an extreme ultraviolet lithography mask in parallel airflow considering electrophoresis

Soojin Kang, Se-Jin Yook () and Kwan-Soo Lee
Additional contact information
Soojin Kang: School of Mechanical Engineering, Hanyang University, Seoul, 133-791, Republic of Korea
Se-Jin Yook: School of Mechanical Engineering, Hanyang University, Seoul, 133-791, Republic of Korea
Kwan-Soo Lee: School of Mechanical Engineering, Hanyang University, Seoul, 133-791, Republic of Korea

International Journal of Modern Physics C (IJMPC), 2014, vol. 25, issue 06, 1-15

Abstract: One of the major issues with Extreme ultraviolet lithography (EUVL) is mask defects, which can occur by particle contamination. Gaussian Diffusion Sphere Model (GDSM) was developed to predict particle deposition velocity considering electrophoresis in addition to Brownian diffusion and gravitational settling of particles. For the validation of GDSM, the particle deposition velocities predicted using GDSM were compared with the computational fluid dynamics (CFD) simulation data. The improved GDSM predicted the particle deposition velocity correctly and had fast calculation time. Using the improved GDSM, in an electric field ranging from 0 V/cm to 1000 V/cm, the effects of both attractive electrophoresis and repulsive electrophoresis were evaluated. For the case considering electrophoresis, not only diffusion but also electrophoresis was dominant for the deposition velocity for submicron particles. Repulsive electrophoresis caused the deposition velocity to decrease. However, when the electric field strength was less than 100 V/cm, deposition was not small enough to be ignored. The deposition velocity was analyzed according to free-stream velocity. The effect of free-stream velocity was noticeable under repulsive electrophoresis, whereas it was suppressed under attractive electrophoresis.

Keywords: Deposition velocity; electrophoresis; Brownian diffusion; gravitational settling; 47.55.Kf; 85.40.Sz (search for similar items in EconPapers)
Date: 2014
References: View complete reference list from CitEc
Citations:

Downloads: (external link)
http://www.worldscientific.com/doi/abs/10.1142/S0129183114500107
Access to full text is restricted to subscribers

Related works:
This item may be available elsewhere in EconPapers: Search for items with the same title.

Export reference: BibTeX RIS (EndNote, ProCite, RefMan) HTML/Text

Persistent link: https://EconPapers.repec.org/RePEc:wsi:ijmpcx:v:25:y:2014:i:06:n:s0129183114500107

Ordering information: This journal article can be ordered from

DOI: 10.1142/S0129183114500107

Access Statistics for this article

International Journal of Modern Physics C (IJMPC) is currently edited by H. J. Herrmann

More articles in International Journal of Modern Physics C (IJMPC) from World Scientific Publishing Co. Pte. Ltd.
Bibliographic data for series maintained by Tai Tone Lim ().