Preparation of In2O3:F thin films grown by spray pyrolysis technique

S.M. Rozati and T. Ganj

Renewable Energy, 2004, vol. 29, issue 10, 1665-1669

Abstract: Transparent conducting fluorine doped indium oxide (In2O3:F) thin films have been deposited on Corning 7059 glass substrates by the spray pyrolysis technique. The structural, electrical, and optical properties of these films were investigated as a function of substrate temperature. The X-ray diffraction pattern of the films deposited at lower substrate temperature (Ts=300 °C) showed no peaks of In2O3:F. In the useful range for deposition (i.e. 425–600 °C), the orientation of the films was predominantly [400]. For the 4500 Å thick In2O3:F deposited with an F content of 10-wt%, the minimum sheet resistance was 120 Ω and average transmission in the visible wavelength rang (400–700 nm) was 88%.

Keywords: In2O3:F; Spray pyrolysis; Transparent-conducting oxide (search for similar items in EconPapers)
Date: 2004
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Persistent link: https://EconPapers.repec.org/RePEc:eee:renene:v:29:y:2004:i:10:p:1665-1669

DOI: 10.1016/j.renene.2004.01.007

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