Silicon nitride film for solar cells

A. El amrani, I. Menous, L. Mahiou, R. Tadjine, A. Touati and A. Lefgoum

Renewable Energy, 2008, vol. 33, issue 10, 2289-2293

Abstract: In this work, our aim was to determine the deposition parameters leading to optimal optical properties of Silicon nitride (SiN) film for photovoltaic application. The deposition was performed in an industrial pulsed direct-PECVD using a gas mixture of NH3/SiH4.

Keywords: PECVD; Silicon nitride; Anti-reflection coating; Passivation (search for similar items in EconPapers)
Date: 2008
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Citations: View citations in EconPapers (2)

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Persistent link: https://EconPapers.repec.org/RePEc:eee:renene:v:33:y:2008:i:10:p:2289-2293

DOI: 10.1016/j.renene.2007.12.015

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