Novel method for detection of mixed-type defect patterns in wafer maps based on a single shot detector algorithm
Tae San Kim,
Jong Wook Lee,
Won Kyung Lee () and
So Young Sohn ()
Additional contact information
Tae San Kim: Yonsei University
Jong Wook Lee: Yonsei University
Won Kyung Lee: Yonsei University
So Young Sohn: Yonsei University
Journal of Intelligent Manufacturing, 2022, vol. 33, issue 6, No 9, 1715-1724
Abstract:
Abstract In semiconductor manufacturing, detecting defect patterns is important because they are directly related to the root causes of failures in the wafer process. The rapid advancement of the integrated circuit technology has recently led to more frequent occurrences of mixed-type defect patterns, wherein two or more defect patterns simultaneously occur in a wafer bin map. The detection of these mixed patterns is more difficult than that of single patterns. To detect these mixed patterns, binary relevance approaches based on convolutional neural networks have been proposed. However, as the manufacturing process has been advanced and integrated, various failure types are newly detected, thus the number of single models can be continuously increased following the diversification of defect types. Therefore, we propose an effective framework for detecting mixed-type patterns in which a simple single model, called the single shot detector, is employed. By applying the proposed model to the WM-811K dataset, we show that our framework outperforms existing CNN-based methods and also provides defect location information.
Keywords: Object detection; Single shot detection; Defect detection; Mixed pattern detection (search for similar items in EconPapers)
Date: 2022
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Citations: View citations in EconPapers (2)
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DOI: 10.1007/s10845-021-01755-6
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